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n&k CD (nm) Uniformity Map Figure 20. n&k Depth (nm) Uniformity Map |  Download Scientific Diagram
n&k CD (nm) Uniformity Map Figure 20. n&k Depth (nm) Uniformity Map | Download Scientific Diagram

Extending ArFi to 22 nm and Beyond with Advanced CDU Control
Extending ArFi to 22 nm and Beyond with Advanced CDU Control

CD uniformity maps obtained using the optical technique described... |  Download Scientific Diagram
CD uniformity maps obtained using the optical technique described... | Download Scientific Diagram

슬라이드 1
슬라이드 1

Global CD uniformity measurement of target line width 75nm on wafer... |  Download Scientific Diagram
Global CD uniformity measurement of target line width 75nm on wafer... | Download Scientific Diagram

Requirement for mask CD uniformity and mask induced overlay error. |  Download Scientific Diagram
Requirement for mask CD uniformity and mask induced overlay error. | Download Scientific Diagram

CD uniformity at pitch 80nm after a/litho and b/etch for negative tone... |  Download Scientific Diagram
CD uniformity at pitch 80nm after a/litho and b/etch for negative tone... | Download Scientific Diagram

CD uniformity over the image field (range) versus focus for 0.25 µm... |  Download Scientific Diagram
CD uniformity over the image field (range) versus focus for 0.25 µm... | Download Scientific Diagram

Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration  - ScienceDirect
Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration - ScienceDirect

Controlling Uniformity At The Edge
Controlling Uniformity At The Edge

Measured CD Uniformity for Conventional Method and New Method.... |  Download Scientific Diagram
Measured CD Uniformity for Conventional Method and New Method.... | Download Scientific Diagram

Local y CD uniformity of 480 nm features-1.0 mm array (left); local... |  Download Scientific Diagram
Local y CD uniformity of 480 nm features-1.0 mm array (left); local... | Download Scientific Diagram

Intel and Nikon Litho Specialists Discuss Overlay Matching and Edge  Placement Error for Production Beyond 20 nm
Intel and Nikon Litho Specialists Discuss Overlay Matching and Edge Placement Error for Production Beyond 20 nm

Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography

Contact local CD uniformity optimization through etch shrink
Contact local CD uniformity optimization through etch shrink

Process Setup and Optimization • LithExx-Systems
Process Setup and Optimization • LithExx-Systems

Global CD uniformity measurement based on 15 points on a reticle. 5 The...  | Download Scientific Diagram
Global CD uniformity measurement based on 15 points on a reticle. 5 The... | Download Scientific Diagram

A study of AA CD uniformity loading optimization at 28nm node | Semantic  Scholar
A study of AA CD uniformity loading optimization at 28nm node | Semantic Scholar

In-field CD uniformity (CDU) of 32nm HP L/S pattern. | Download Scientific  Diagram
In-field CD uniformity (CDU) of 32nm HP L/S pattern. | Download Scientific Diagram

Critical Dimension Control and its Implications in IC Performance - ppt  download
Critical Dimension Control and its Implications in IC Performance - ppt download

Global AEI CD uniformity comparison between n&k R-T Scatterometer and... |  Download Scientific Diagram
Global AEI CD uniformity comparison between n&k R-T Scatterometer and... | Download Scientific Diagram

Photomask
Photomask

Across Wafer Critical Dimension Uniformity Enhancement Through Lithography  and Etch Process Sequence: Concept, Approach, Modeling, and Experiment |  Semantic Scholar
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar